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将硅片放入扩散炉前，应先对其进行清洗，以去除其表面的杂质和颗粒。这被称为“预扩散清洁”。我们可以使用多种方法进行预扩散清洁。
Before silicon wafers are placed in a diffusion furnace, they should be cleaned first to remove impurities and particles from their surfaces.This is known as “pre-diffusion cleaning.” Pre-diffusion cleaning can be done using various methods.
1.RCA清洗工艺（主要包括两步）
标准清洁 1 (SC1)-使用含有氢氧化铵和过氧化氢的溶液清洁硅片，这有助于去除有机颗粒。然而，金属离子仍然存在于晶片表面。
Standard cleaning 1 (SC1) – The silicon wafers are cleaned with a solution containing ammonium hydroxide and hydrogen peroxide, which helps in removing organic particles. However, the metallic ions are still present in the wafers’ surfaces.
标准清洗 2 (SC2)-经过 SC1 后，硅片在含有盐酸和过氧化氢的浴槽中清洗。该解决方案可去除晶片表面残留的金属痕迹。
Standard cleaning 2 (SC2) – After undergoing the SC1, the silicon wafers are cleaned in a bath containing hydrochloric acid and hydrogen peroxide. This solution removes leftover metallic traces from the wafers’ surfaces.
2.刻蚀清洁
这种方法使用硫酸和过氧化氢的溶液，从晶片上溶解更多和更顽固的有机残留物。
This method uses a solution of sulfuric acid and hydrogen peroxide, which dissolves larger and more stubborn amounts of organic residue from the wafers.
3.兆声波清洗
使用由兆声波在浴槽中产生的空化气泡去除晶片上的杂质。与其他方法不同，兆声波清洗不使用刺激性化学浴。
Uses cavitation bubbles produced by megasonic waves in a bath to remove impurities from the wafers. Unlike other methods, megasonic cleaning doesn’t use harsh chemical baths.
4.臭氧清洗
使用去离子 (DI) 水将晶片上的无机污染物冲洗掉。然后将晶片放置在臭氧室内。臭氧强大的氧化作用将有机颗粒转化为碳，使晶片保持清洁，不含杂质。
Uses deionized (DI) water to rinse the inorganic contaminants away from the wafers. Then the wafers are placed inside the ozone chamber. The ozone’s powerful oxidizing action converts the organic particles to carbon, leaving the wafers clean and free from impurities.
未彻底清洁的晶片可能会影响后续的扩散步骤并对最终产品产生负面影响。这就是为什么预扩散清洁很重要。华林科纳提供完整的湿处理设备系列，支持上述晶圆清洗工艺。这些旨在提供有效的清洁，使硅晶片无颗粒并准备好扩散。
Unthoroughly cleaned wafers may affect subsequent diffusion steps and negatively affect the final product.That is why pre-diffusion cleaning is important.Hualinkena provides a complete range of wet treatment equipment that supports the above wafer cleaning process.These are intended to provide effective cleaning, making the silicon wafer grain-free and ready to spread.